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Structure and properties of (TiVCrZrY)N coatings prepared by energetic bombardment sputtering with different nitrogen flow ratios |
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| Authors: | Du-Cheng Tsai Zue-Chin Chang Bing-Hau Kuo Ming-Hua Shiao Shou-Yi Chang Fuh-Sheng Shieu |
| Institution: | 1. Department of Materials Science and Engineering, National Chung Hsing University, Taichung, 40227, Taiwan 2. Department of Mechanical Engineering, National Chin-Yi University of Technology, Taichung, 41170, Taiwan 3. Instrument Technology Research Center, National Applied Research Laboratories, Hsinchu, 300, Taiwan 4. Center of Nanoscience & Nanotechnology, National Chung Hsing University, Taichung, 40227, Taiwan |
| Abstract: | (TiVCrZrY)N coatings were deposited onto Si substrate by the radio-frequency (RF) magnetron sputtering of a TiVCrZrY alloy target in an N2/Ar atmosphere. The crystal, microstructural, mechanical, and electrical properties at different N2-to-total (N2+Ar) flow-rate ratio (R N) values were investigated. The coating produced in pure Ar had an equiaxed structure with a hexagonal-close-packed phase. With increased R N, the crystallinity and grain size markedly decreased. The microstructure of (TiVCrZrY)N coatings transformed from V-shaped columnar with a rough-domed surface into fine fibrous with a smooth surface. The amorphous transition layer above the substrate was also significantly thickened. The hardness of (TiVCrZrY)N decreased from 20.9 GPa to 18.9 GPa, and the electrical resistivity increased from 398.2 μΩ?cm to 21870 μΩ?cm. |
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