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Characterization of photovoltage evolution of ZnO films using a scanning Kelvin probe system
Authors:W. Li  C.W. Wu  W.G. Qin  G.C. Wang  S.Q. Lu  X.J. Dong  H.B. Dong  Q.L. Sun
Affiliation:School of Materials Science and Engineering, Nanchang Hangkong University, Nanchang 330063, PR China
Abstract:Work function (WF) and surface photovoltage evolution of films can be measured using the Kelvin probe technique, and further analysis of the photoelectronic behavior can provide information on the energy level structure. In this paper, a theoretical analysis to measure surface photovoltage using Kelvin probe technique is presented. Based on this analysis, the surface photovoltage and its time-resolved evolution process as well as the energy level structure of ZnO films are determined using a scanning Kelvin probe. The present study therefore provides a simple and practical methodology for the characterization of the electronic behavior of films.
Keywords:Kelvin probe   Photovoltage   Work function   ZnO
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