Limit analysis for laser removal of micron contaminant colloidal silicon dioxide particles from the super-smooth optical glass substrate by pulse Nd:YAG laser |
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Authors: | Meng Hua Xingkuan Shi Edmund Cheung Weizheng Yuan |
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Affiliation: | a Department of Manufacturing Engineering and Engineering Management, City University of Hong Kong, 83 Tat Chee Avenue, Kowloon Tong, Hong Kong;b Department of Aircraft Manufacturing Engineering, Northwestern Polytechnical University, Xi'an Shaanxi 710072, PR China |
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Abstract: | Multimode Nd:YAG pulse laser was applied to remove micron and submicron particles by vaporizing a thin paint film pre-coated on super-smooth optical substrate surface. By analyzing the poor absorption of the optical glass substrate to the irradiative Nd:YAG pulse laser, the removal mechanism of contaminated colloidal particles from the super-smooth surface through vaporization of a volatile solid film is described. A limit analysis was proposed to determine the lower and the upper threshold of laser fluence for cleaning the SiO2 contaminants from super-smooth K8 optical substrate. Relevant experiments on laser cleaning of micron-polishing particles from super-smooth K8 optical substrate confirmed the usefulness of this method in assisting the selection of effective cleaning fluence for accomplishing high cleanliness, which was in a range of 80–90% of the predicted upper threshold. |
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Keywords: | Super-smooth substrate surface Laser cleaning Micro-particle contamination Nd:YAG laser |
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