A cationic surfactant-induced selective etching strategy for the synthesis of organosilica hollow nanospheres |
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| Authors: | Yu Wang Lianxi Chen Zhenhui Liu Jie Li Pengpeng Wang |
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| Institution: | 1.School of Chemistry, Chemical Engineer and Life Science,Wuhan University of Technology,Wuhan,P. R. China;2.School of Materials Science and Engineering,Wuhan University of Technology,Wuhan,P. R. China;3.Food science and engineering college,Wuchang Institute of Technology,Wuhan,P. R. China |
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| Abstract: | The simple and effective synthesis of well-defined organosilica hollow nanospheres (OHNSs) for fundamental research and practical applications is still a significant challenge. In this work, a facile “cationic surfactant-induced selective etching” strategy was developed for the fabrication of hollow thiocyanatopropyl silsesquioxanes (thiocyanatopropyl-SQ), mercaptopropyl silsesquioxane (mercaptopropyl-SQ) from cyanoethyl-SQ@thiocyanatopropyl-SQ and cyanoethyl-SQ@mercaptopropyl-SQ, respectively. The experiments demonstrated that cetyltrimethylammonium bromide (CTAB) had remarkable influence on the formation of hollow structure and could accelerate the etching process significantly. A formation mechanism initiated by the adsorption of cationic surfactant followed by the etching of inner core with NH3·H2O was proposed. Hollow thiocyanatopropyl-SQ and mercaptopropyl-SQ with various shell thickness could be prepared by manipulating the amount of CTAB. And large-scale OHNSs were obtained at appropriate concentration of CTAB through this strategy. Moreover, this strategy might be further extended to fabricate OHNSs with other worthy functional groups. | |
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