锆表面氧化膜的光电化学研究

用光电化学方法研究了金属锆的表面初始氧化膜和线性电势扫描形成阳极氧化膜．光电流作用谱上的阳极和阴极光电流取决于电极电势，而与成膜和测量溶液基本无关．光电流作用谱和瞬态光电流响应说明锆表面氧化膜为双层结构，内层为ＺｒＯ＿２外层为ＺｒＯ＿２·（Ｈ＿２Ｏ）＿ｎ．光电流可以来自内、外层的光生载流子和基底金属的内光注入电子迁移至电极／溶液界面与溶液中的氧化还原对反应，光电流作用谱的分析给出了三个过程的光学间能值，分别为４．５ｅＶ、３．０ｅＶ和２．０ｅＶ．

A Photoelectrochemical Investigation of Zirconium oxide film

A photoelectrochemical investigation has been carried out on zirconium initialoxide film and its oxide film grownanodically at constant rate up to different thickness. Both anodicand cathedic photocurrents on the photocurrent spectrum depended on the potential,but had littlerelation with the forming anedic films or measuring solutions. Photocurrent spectrum and photocurrenttransients suggested that the oxide films on zirconium were duplex layers structure. The internal layerwas ZrO_2 and the external layer ZrO_2·(H_2O)_n. The photocurrent included photogenerated carrier ininternal and external oxide films,as well as internal photoinjection process for electrons from thesubstrate metal into the electrode/electolyte interface reacting with the redox couple. The analysis ofphotocurrent spectra has given the threshold energies for three processes.