| 碱水显影阻焊油墨研究—羧基与环氧基的反应 |
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| 引用本文： | 曾兆华,杨建文,覃海定,陈用烈.碱水显影阻焊油墨研究—羧基与环氧基的反应[J].应用化学,2002,19(1):18-0. |
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| 作者姓名： | 曾兆华 杨建文 覃海定 陈用烈 |
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| 作者单位： | 中山大学 |
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| 基金项目： | 国家自然科学基金资助项目 ( 5 99730 2 7) |
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| 摘 要： | 二元酸单甲酯;环氧化合物;碱水显影阻焊油墨研究—羧基与环氧基的反应
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| 关 键 词： | 二元酸单甲酯 环氧化合物 碱水显影阻焊油墨研究—羧基与环氧基的反应 |
| 文章编号： | 1000-0518(2002)01-0018-04 |
| 收稿时间： | 2009-06-29 |
| 修稿时间： | 2001年5月22日 |
Study on Liquid Alkali Developing Type Solder Resists:Reaction Between Dibasic Acid Half-ester with Epoxy Compound |
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| ZENG Zhao-Hua ,YANG Jian-Wen,QIN Hai-Ding,CHEN Yong-Lie.Study on Liquid Alkali Developing Type Solder Resists:Reaction Between Dibasic Acid Half-ester with Epoxy Compound[J].Chinese Journal of Applied Chemistry,2002,19(1):18-0. |
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| Authors: | ZENG Zhao-Hua YANG Jian-Wen QIN Hai-Ding CHEN Yong-Lie |
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| Institution: | ZENG Zhao-Hua *,YANG Jian-Wen,QIN Hai-Ding,CHEN Yong-Lie |
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| Abstract: | Reaction of dibasic acid half-ester with epoxy compound has been investigated as function of factors affecting the reaction between carboxyl groups and epoxy using half-esters of a series of acid: maleic acid(MAM), succinic acid(SAM), phthalic acid(PAM), cis-1,2,3,6-tetrahydrophthalic acid(H4PAM) and cis-hexahydrophthalic acid(H6PAM), and phenyl glycidyl ether(PGE) as model compounds. It was found that higher reactivity would be achieved for the dibasic acid half-esters with smaller molecular size or stronger acidity. In the case of reaction between maleic acid monomethyl eater(MAM) and PGE, the catalytic activity of the catalysts decreased in the order of chromium acetylacetonate (CrAA)>tetramethyl ammonium bromide(TMAB)>1-methylimidazole(MI)>N,N-dimethyl benzylamine(DMBA). The effects of solvent polarity and temperature on the reaction has also been examined. |
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| Keywords: | liquid alkali developing solder resist dibasic acid half-ester epoxy |
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