UV-excimer-laser ablation of polymethylmethacrylate at 248 nm: Characterization of incubation sites with Fourier transform IR- and UV-Spectroscopy

Ultraviolet and Fourier transform infrared (FTIR) spectroscopic experiments with thin films of polymethylmethacrylate (PMMA) are reported. During the incubation with 248 nm excimer laser light or continuous (cw) UV light sources PMMA exhibits a rapidly increasing, broad UV absorption. This is caused by the production of unsaturated species, which are detected in the infrared spectrum of irradiated PMMA films. The spectral data explain the incubation process preceding the ablation of PMMA at 248 nm. Taking advantage of the increased UV absorption, cw light incubated PMMA films can be selectively ablated by standard 308 nm excimer laser pulses.