Photolithographically patternable nitrate-sensitive acrylate-based membrane |
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| Authors: | C Dumschat R Frömer H Rautschek H Müller H-J Timpe |
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| Institution: | Technische Hochschule “Carl Schorlemmer” Leuna-Merseburg, Sektion Chemie, 4200 Merseburg, Germany |
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| Abstract: | A photocurable acrylate matrix nitrate-sensitive membrane containing 2-nitrophenyl n-octyl ether as mediator and tetraalkylammonium nitrate as an active compound is described. The photocuring was achieved by the use of photoinitiators containing diaryliodonium chloride. This acrylate membrane is patternable via a photolithographic process with a only slight loss of electrochemical characteristics. |
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| Keywords: | Ion-selective electrodes Photolithographic patterning Membrane electrodes Nitrate |
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