Structure and electrical characteristics of ICBD C60 films

Polycrystalline C₆₀ films are deposited onto a variety of substrates by ionized cluster beam deposition (ICBD) technique. The structure of the ICBD C₆₀ films are studied by transmission electron microscopy (TEM). The electrical characteristics of the ICBD C₆₀ films on silicon substrates are investigated by current-voltage (I–V) measurements. TheICBD C₆₀/p-Si and C₆₀/n-Si heterostructures show strong current rectification, which is analyzed using band theory.