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The effect of hydrogenation in HgxCd1 − xTe thin films grown on p-CdTe (211) B substrates
Authors:M. S. Han   T. W. Kang   M. D. Kim   Y. T. Jeoung   H. K. Kim   J. M. Kim   H. J. Woo  T. W. Kim
Affiliation:

a Department of Physics, Dongguk University, 3-26 Pil-dong Chung-ku, Seoul 100-715, South Korea

b Photonics Semiconductor Laboratory, Materials and Devices Research Center, Samsung Advanced Institute of Technology, Suwon 440-600, South Korea

c Agency for Defence Development, Daejon 300-600, South Korea

d Korea Institute of Geology, Mining and Materials, Daejon 305-600, South Korea

e Department of Physics, Kwangwoon University, Seoul 139-701, South Korea

Abstract:Fourier transform infrared (FTIR) transmission, Hall effect, and nuclear resonance reaction measurements have been carried out to investigate the effect of hydrogenation on the deep levels and the hydrogen depth profiling in nominally undoped HgxCd1 − xTe layers grown on undoped p-CdTe (211) B-orientation substrates by molecular beam epitaxy. After hydrogenation, the FTIR spectra showed that the transmittance intensity increased in comparison to that of the as-grown HgxCd1 − xTe and that the absorption edge shifted to the short wavelength range. Hall effect measurements showed that the carrier concentration decreased and the mobility increased after hydrogenation. After hydrogenation, p-type HgxCd1 − xTe is converted to n-type HgxCd1 − xTe with high resistivity. Nuclear resonance raaction measurements show that the concentration and the penetration depth of the hydrogen atom in n-Hg0.77Cd0.23Te are 3.5% and 640 Å, respectively. The areal density of the hydrogen-containing layer at the surface of the hydrogenated n-Hg0.77Cd0.23Te film is 4.39 × 1015 atoms/cm2. These results indicate that hydrogen atoms not only effectively passivate impurities or defects in the HgxCd1 − xTe film but also change the carrier type of p-HgxCd1 − xTe.
Keywords:
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