首页 | 本学科首页   官方微博 | 高级检索  
     检索      


Formation of Ohmic contacts on laser irradiated n-type 6H-SiC without thermal annealing
Authors:Yan Wu  Lingfei Ji  Zhenyuan Lin  Minghui Hong  Sicong Wang  Yongzhe Zhang
Institution:1. Institute of Laser Engineering, Beijing University of Technology, Beijing, 100124, China;2. Department of Electrical and Computer Engineering, National University of Singapore, 117576, Singapore;3. College of Materials Science and Engineering, Beijing University of Technology, Beijing, 100124, China
Abstract:In this work, KrF excimer laser irradiation of n-type SiC is used to form Ohmic contacts at the interfaces between the irradiated SiC and various types of metals with different work functions without subsequent thermal annealing. Ohmic contacts are formed between laser-treated 6H-SiC and Ti at a laser fluence of 0.7 J/cm2. Moreover, in the fluence range of 0.7–1.3 J/cm2, Ohmic characteristics are also observed between irradiated 6H-SiC and Au, which is a representative inert metal. The laser-induced heavy doping effect reduces the thickness of the Schottky barrier between the metal and SiC, and the formation of graphene sheets on the irradiated SiC surface reduces the barrier height, resulting in the direct formation of Ohmic contacts. Our findings thus demonstrate the potential of this laser treatment method to achieve Ohmic contacts between n-type SiC and a broad range of metal electrodes without requiring high-temperature annealing.
Keywords:Corresponding author    SiC  Ohmic contact  Excimer laser  Barrier height
本文献已被 ScienceDirect 等数据库收录!
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号