Enhanced dissolution of copolymers bearing photobase- or photoacid-generating groups in polar solvents by photochemical formation of ionic pairs |
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Authors: | Kanji Suyama Shizue Yamaguchi Masamitsu Shirai Masahiro Tsunooka |
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Institution: | Department of Applied Chemistry, Osaka Prefecture University, 1-1 Gakuen-cho, Sakai, Osaka 599-8531, Japan |
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Abstract: | Solubility changes in the irradiation of copolymers bearing photoacid- or photobase-generating groups and low molecular weight photobase generators (PBGs) or photoacid generators (PAGs) were investigated. Copolymers bearing acyloxyimino (AOI) groups were used as those generating pendant amino groups photochemically. Copolymers bearing o-nitrobenzyloxycarbonyl and imino sulfonate groups were used as those generating carboxy and sulfo groups, respectively. The solubility of copolymers bearing AOI groups into polar solvents was enhanced by added PAGs such as β-keto sulfones or imino sulfonates after irradiation. A similar enhancement was observed in copolymers bearing o-nitrobenzyloxycarbonyl groups in the presence of PBGs such as oxime esters or o-nitrobenzyl carbamates. These results showed that the formation of acid–base pairs on irradiation was effective for dissolution into polar solvents. Copolymers bearing imino sulfonate groups showed a high solubility, and no such enhancement was observed by PBG. Films of copolymers bearing β-keto sulfone groups became insoluble because of crosslinking. © 2001 John Wiley & Sons, Inc. J Polym Sci A: Polym Chem 39: 1708–1715, 2001 |
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Keywords: | UV irradiation dissolution photobase generator photoacid generator acid base pair |
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