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Fabrication and characterization of graphene derived from SiC
Authors:YuPing Jia  LiWei Guo  Wei Lu  Yu Guo  JingJing Lin  KaiXing Zhu  LianLian Chen  QingSong Huang  Jiao Huang  ZhiLin Li  XiaoLong Chen
Affiliation:1. Research & Development Center for Functional Crystals, Beijing National Laboratory for Condensed Matter Physics, Institute of Physics, Chinese Academy of Sciences, Beijing, 100190, China
Abstract:Using novel ideas for the fabrication of epitaxial graphene (EG) on SiC, two forms of graphene termed as vertical aligned graphene sheets (VAGS) and graphene covered SiC powder (GCSP) were derived, respectively, from SiC slices and SiC powder, aimed for applications in energy storage and photocatalysis. Herein, the fabrication procedures, morphology characteristics, some intrinsic physical properties and performances for applications in field effect transistor (FET) and cold cathode field emission source are revealed and analyzed based on the graphene materials. The EG on a 2-inch SiC (0001) showed an average sheet resistance about 720 Ω/□ with a non-uniformity 7.2%. The FETs fabricated on the EG possessed a cutoff frequency 80 GHz. Based on the VAGS derived from a completely carbonized SiC slice, a magnetic phase diagram of graphene with irregular zigzag edges is also reported.
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