|
|||||
|
|
Ab Initio Chemical Kinetics for the Thermal Decomposition of SiH4 + Ion and Related Reverse Ion–Molecule Reactions of Interest to PECVD of a-Si:H Films |
|
| Authors: | Nguyen T N Lee Y M Wu J S Lin M C |
| Institution: | 1.Department of Applied Chemistry, Center for Interdisciplinary Molecular Science, National Chiao Tung University, Hsinchu, 300, Taiwan ;2.Department of Mechanical Engineering, National Chiao Tung University, Hsinchu, 300, Taiwan ;3.Department of Physical Chemistry, Hanoi University of Science and Technology, Hanoi, Vietnam ; |
| Abstract: | Plasma Chemistry and Plasma Processing - The thermal unimolecular decomposition of SiH4 + ion and its related reverse reactions, SiH3 + + H and SiH2 + + H2, have... |
| Keywords: | |
| 本文献已被 SpringerLink 等数据库收录！ | |