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Monocrystalline Quartz ICP Etching: Road to High-Temperature Dry Etching |
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| Authors: | Osipov Artem A. Iankevich Gleb A. Alexandrov Sergey E. |
| Affiliation: | 1.Department of Physics, Chemistry and Technology of Microsystems Equipment, Peter the Great St.-Petersburg Polytechnic University, St.-Petersburg, Russia, 195251 ;2.Institute of Nanotechnology, Karlsruhe Institute of Technology, Hermann-von-Helmholtz-Platz 1, 76344, Eggenstein-Leopoldshafen, Germany ;3.Institute of Mineralogy, Ural Branch, Russian Academy of Sciences, Miass, Chelyabinsk Oblast, Russia, 456317 ; |
| Abstract: | Plasma Chemistry and Plasma Processing - In this study, the dry plasma-chemical etching process of monocrystalline SiO2 (quartz) in a fluoride-based (sulfur hexafluoride, SF6) inductively coupled... |
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