Characteristics of a cylindrical magnetron and reactive sputtering of binary compound films

The characteristics of a cylindrical magnetron, such as the dependences of the discharge voltage, chamber pressure, and plasma radiation intensity on the reactive gas flow rate and discharge current, are studied. In this magnetron, titanium nitride (TiN) and titanium dioxide (TiO₂) films are obtained by reactive magnetron sputtering. The transmission and reflection spectra of the films in the visual range are taken. From the transmission data for the TiO₂ films, their refractive index and absorption factor in the wavelength range 350–800 nm, as well as the porosity, are found by the Valeev method. The variation of the fundamental absorption edge with film thickness is determined with the Urbach formula.