Effect of Pt loading on the photocatalytic reactivity of titanium oxide thin films prepared by ion engineering techniques |
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Authors: | Masato Takeuchi Kouichirou Tsujimaru Kenji Sakamoto Masaya Matsuoka Hiromi Yamashita Masakazu Anpo |
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Affiliation: | (1) Osaka Prefecture University, 11 Gakuencho, Sakai, Osaka, 5998531, Japan;(2) Department of Electronic Engineering, Osaka University, Yamadaoka 11, Suita, Osaka, 5650871, Japan;(3) Human Environment Systems Development Center, Matsushita Electric Industrial Co., Ltd., Seikacho, Souraku, Kyoto, 6190237, Japan;(4) Ion Engineering Research Institute Corporation, Tsuda, Hirakata, Osaka, 5730128, Japan |
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Abstract: | Platinum-loaded titanium oxide thin-film photocatalysts were prepared by using an ionized cluster beam (ICB) deposition method and a RF magnetron sputtering (RF-MS) deposition method as dry processes. From the results of the photocatalytic oxidation of acetaldehyde with O2 under UV light irradiation, small amounts of Pt loading (less than 10 nm film thickness) were found to dramatically enhance the photocatalytic reactivity. However, when TiO2 thin films were loaded with relatively larger amounts of Pt (more than 30 nm as the film thickness), the photocatalytic reactivity became lower than for the pure TiO2 thin films. Moreover, investigations of the ratio of Pt loaded onto the surface of the thin film catalysts by XPS measurements revealed that the small amounts of Pt loaded exist as very small clusters working to efficiently enhance the charge separation, whereas, large amounts of Pt covers the entire surface of the TiO2 thin films, resulting in a decrease of the photocatalytic reactivity. |
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Keywords: | TITANIUM OXIDE THIN FILM PHOTOCATALYTIC OXIDATION PT LOADING EFFECT ION CLUSTER BEAM DEPOSITION METHOD |
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