Track etching parameters for plastics |
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| Authors: | G E Blanford Jr R M Walker J P Wefel |
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| Institution: | Laboratory for Space Physics , Washington University , Saint Louis, Missouri, 63130, U.S.A. |
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| Abstract: | Abstract A series of experiments was performed to study the effect of types of etchant, concentration of etchant, etchant temperature and other parameters on track development in cellulose nitrate, polycarbonate resin, cellulose triacetate, and cellulose acetate butyrate plastic. This work has led to a set of preferred etching conditions for each of these plastics. For example, although there were only slight differences in general etching rate when LiOH, KOH, and NaOH were used as track etchants for cellulose nitrate, the alpha particle registration sensitivity was greatest when NaOH was used. Also in cellulose nitrate the general etching rate and the particle registration sensitivity did not change significantly with increasing concentration for hydroxide solutions > 6 N. This was in marked contrast to other plastics which showed a strong concentration dependence. |
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