| Abstract: | The thermal decomposition and etching of GaP have been investigated. The {111} GaP surfaces were treated in 10−2—10−5 torr vacuum, and in hydrogen and argon atmosphere, in a temperature range of 900—1300 K. Under the different experimental conditions the etched surfaces show different morphological characteristics and polar properties, from which the suitable range for thermal etching or polishing can be choosen. All experiments show that the evaporation mechanism in vacuum and argon is similar, but in hydrogen the process is different. |
