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Surface and interface analysis at 3rd generation light sources |
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| Authors: | F. J. Himpsel, H. Akatsu, J. A. Carlisle, D. G. J. Sutherland, I. Jimenez, L. J. Terminello, J. J. Jia, T. A. Callcott, M. G. Samant, J. St hr, D. L. Ederer, R. C. C. Perera, W. Tong,D. K. Shunh |
| Affiliation: | a IBM Research Division, Thomas J. Watson Research Center, Yorktown Heights, NY 10598, U.S.A. b Lawrence Livermore National Laboratory, Livermore, CA 94551, U.S.A. c University of Tennessee, Knoxville, TN 37996, U.S.A. d IBM Research Division, Almaden Research Centre, 650 Harry Road, San Jose, CA 95120-6099, U.S.A. e Tulane University, New Orleans, LA 70118, U.S.A. f Lawrence Berkeley Laboratory, Berkeley, CA 94720, U.S.A. |
| Abstract: | A third generation of synchrotron radiation facilities is coming on line worldwide, whose brilliance exceeds previous ultraviolet and x-ray light sources by four orders of magnitude. The capabilities at second and third generation light sources are discussed, using examples in surface and interface chemistry and magnetic nanostructures. The authors' experience at the IBM-Tennessee-Tulane-LLNL-LBL undulator beam line will serve as a hands-on guide for work at one of the new facilities. |
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