X-ray photoelectron (XPS) and Auger (XAES) spectroscopy study of rhodium dispersed on carbon substrate |
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Authors: | V. Anděra |
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Affiliation: | (1) ESCA Centre, J. Heyrovský Institute of Physical Chemistry and Electrochemistry, Czechosl. Acad. Sci., Vlaská 9, 11840 Praha 1, Czechoslovakia |
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Abstract: | Photoelectron 3d5/2 binding and Auger M5VV kinetic energies of dispersed rhodium have been measured. For the smallest deposition of Rh the shifts 0·6 eV and -2·5 eV of 3d5/2 and M5VV lines respectively have been found. Electron core level energy, Auger kinetic energy and Fermi edge shifts have been interpreted by a model based on electrostatic relaxation mechanism in metal particles and initial state contribution of surface atoms. Intensity and background height analysis indicate only surface distribution of Rh.I wish to express my gratitude to Dr. Zdenk Bastl for helpful discussions. |
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