Structural properties of polycrystalline silicon films formed by pulsed rapid thermal processing |
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Authors: | Wang Yong-Qian Liao Xian-Bo Diao Hong-Wei Zhang Shi-Bin Xu Yan-Yue Chen Chang-Yong Chen Wei-De and Kong Guang-Lin |
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Institution: | State Key Laboratory for Surface Physics, Institute of Semiconductors and Centre for Condensed Matter Physics, Chinese Academy of Sciences, Beijing 100083, China |
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Abstract: | A novel pulsed rapid thermal processing (PRTP) method has been used for realizing solid-phase crystallization of amorphous silicon films prepared by plasma-enhanced chemical vapour deposition. The microstructure and surface morphology of the crystallized films were investigated using x-ray diffraction and atomic force microscopy. The results indicate that PRTP is a suitable post-crystallization technique for fabricating large-area polycrystalline silicon films with good structural quality, such as large grain size, small lattice microstrain and smooth surface morphology on low-cost glass substrates. |
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Keywords: | polycrystalline silicon film rapid thermal processing microstructure |
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