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Structural and phase composition of fullerene films deposited by high-power ion beams
Authors:V. K. Struts  V. M. Matvienko  A. V. Petrov  A. I. Ryabchikov  Yu. P. Usov  T. J. Renk
Affiliation:1.Institute of Nuclear Physics,Tomsk,Russia;2.Sandia National Laboratoriesy,Albuquerque,USA
Abstract:Deposition of carbon films containing C60 and C70 fullerenes is an urgent problem, related to development of nanotechnologies and new nanomaterials. Such films have been obtained by ultrafast deposition of dense ablation plasma on a substrate; the plasma was generated as a result of irradiation of a graphite target by pulsed high-power ion beams. The structural and phase composition of the deposited films has been investigated.
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