Investigation of Ge and C layer deposition on a Si substrate using SIMS profiling

Structures grown using the technique of molecular-beam epitaxy during deposition of carbon and/or germanium atoms on an Si(111) surface were investigated experimentally and theoretically. Experimental profiles of in-depth component distribution were obtained using SIMS-profiling, whereas a complex technique of computer simulation taking into account diffusion and ballistic processes was applied for the calculated profiles.