Crystalline structure of oxide-based epitaxial tunnel junctions |
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Authors: | C Mocuta A Barbier A V Ramos M-J Guittet J-B Moussy S Stanescu C Gatel R Mattana C Deranlot and F Petroff |
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Institution: | 1.European Synchrotron Radiation Facility, BP. 220,Grenoble,France;2.CEA-Saclay,Gif-sur-Yvette,France;3.Synchrotron SOLEIL, Saint-Aubin, BP. 48,Gif-sur-Yvette Cedex,France;4.Centre d’élaboration des Matériaux et d’études Structurales, CNRS,Toulouse,France;5.Unité Mixte de Physique CNRS/Thales, Route Départementale 128, 91767 Palaiseau Cedex and Université Paris-Sud 11,Orsay,France |
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Abstract: | Epitaxial metal/oxide based magnetic tunnel-junctions
(MTJ) are valuable model systems to investigate the influence of the
crystallinity of individual layers on the magnetic properties. We
have non-destructively studied the effect of the optical lithography
procedure on the crystalline structure of MTJ’s with lateral spatial
resolution by performing local x-ray diffraction experiments using a
microfocused x-ray spot. We demonstrate that the lithography process
produces distortion effects on the crystalline structure of the
layers near the edges of the lithographed junction. These
distortions are present on all the constituent layers and are most
probably driven by the elastic constants of the materials. They
translate into tilts of the crystalline planes in the vicinity of
the edges and propagate towards the center of the junction; the
tilt’s amplitude (up to several degrees) and sign (concave or
convex) depend on the junction’s shape, size and the type of
materials (interfaces) used. We report results for junctions made
with two types of metal-oxide interfaces (Co/CoFe2O4 and
Co/Fe3O4), with sizes from 10 to 150 μm and various shapes
(square-, rectangle- and disk-like). |
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