Fabrication and characterization of fluorine-doped thin oxide thin films and nanorod arrays via spray pyrolysis

This paper reports the synthesis and characterization of fluorine-doped tin oxide (FTO) thin films via intermittent spray pyrolysis utilizing a solution mixture of tin chloride pentahydrate and ammonia fluoride. Utilizing the same solution, nanorod arrays were fabricated via template-based growth. Uniform and crack-free FTO films over 20×20 mm with a thickness up to 900 nm have been routinely achieved; such FTO films demonstrate electrical resistivity as low as 2.2×10^-4 Ω cm as well as good optical transparency ranging from 75 to 85%. In addition, FTO nanorods were fabricated using template-filling methods at a temperature of 440 °C. The nanorods have a diameter of ∼160–250 nm, appear to be comprised of small nanoparticles 5–10 nm in size, and have a resistivity value of 4×10^-1 Ω cm. PACS 81.07.-b; 73.61.-r; 81.16.Be