工业纯钛微弧氧化膜的结构及拉曼光谱分析

采用微弧氧化技术，用处理电压为300, 350, 400, 450, 500 V在工业纯钛表面制备了5块氧化膜试样，利用扫描电镜和拉曼光谱研究了处理电压对氧化膜结构的影响。结果表明：氧化膜表面布满了微孔，其尺寸随处理电压的升高而增加，而微孔密度则呈相反的变化趋势。氧化膜主要由锐钛矿和金红石相组成，其相含量与处理电压的大小密切相关。当处理电压较低时，氧化膜主要由锐钛矿相组成; 随着处理电压的升高，氧化膜中金红石相的相对含量增加; 当处理电压在400～450 V时，金红石相含量增加迅速，并成为主晶相。

The Microstructure and Raman Spectra Analysis of MAO Film on Pure Titanium

In the present work, five films on the surface of pure titanium were formed by microarc oxidation technique at various applied voltages: 300, 350, 400, 450 and 500 V. The phase component and microstructure of these films were analyzed by scanning electron microscopy and Raman spectroscopy. The result shows that the surface of the films is covered by numerous micropores. With the increase in applied voltage, the size of these micropores increases, but the density of these micropores declines. These films consist of anatase and rutile phases, and the phase component of the film is closely related to the applied voltage. In the condition of lower applied voltage, the film is mainly composed of anatase phase. With increasing the applied voltage, the content of rutile phase increases, and when the applied voltage ranges from 400 to 450 V, the rutile phase increases sharply and becomes domain phase.