| 超辐射发光二极管抗反射膜的设计 |
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| 引用本文： | 张一文,王品红,廖柯. 超辐射发光二极管抗反射膜的设计[J]. 光学与光电技术, 2005, 3(6): 32-34 |
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| 作者姓名： | 张一文 王品红 廖柯 |
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| 作者单位： | 1. 重庆邮电学院光电学院,重庆,400065
2. 重庆光电技术研究所,重庆,400060 |
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| 摘 要： | 分析了设计超辐射发光二极管抗反射膜的光导纳法,介绍了有效折射率的概念。选用TiO2和SiO2两种材料给出了中心波长为850 nm时的设计实例。结果表明设计时要考虑有效折射率,才能获得好的性能。
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| 关 键 词： | 超辐射发光二极管 抗反射膜 光导纳法 有效折射率 |
| 文章编号： | 1672-3392（2005）06-0032-03 |
| 收稿时间： | 2005-07-26 |
| 修稿时间： | 2005-09-27 |
Design of Antireflection Coating for Superluminescent Diodes |
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| ZHANG Yi-wen,WANG Pin-hong,LIAO-Ke. Design of Antireflection Coating for Superluminescent Diodes[J]. optics&optoelectronic technology, 2005, 3(6): 32-34 |
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| Authors: | ZHANG Yi-wen WANG Pin-hong LIAO-Ke |
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| Abstract: | The optical admittance approach to design antireflection coatings of superluminescent diodes is described and effective refractive index is introduced.A design example is given for the center-wavelength of 850nm by choosing TiO2 and SiO2,and the result shows that effective refractive index must be considered while designing in order to achieve good performance. |
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| Keywords: | superluminescent diodes antireflection coatings optical admittance approach effective refractive index |
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