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Nanoscratch study of Zn1−xMnxO heteroepitaxial layers |
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| Authors: | Yu-Ming Chang Derming Lian Wei-Hung Yau Wen-Fa Wu |
| Institution: | a Institute and Department of Mechanical Engineering, National Chiao Tung University, Hsinchu 300, Taiwan, ROC b Department of Mechanical Engineering, Chin-Yi University of Technology, Taichung 400, Taiwan, ROC c Graduate Institute of Electro-Optical Engineering, Tatung University, Taipei 10452, Taiwan, ROC d Department of Automation Engineering, Nan Kai University of Technology, 568 Chung-Cheng RD, Nantou 54243, Taiwan, ROC e National Nano Device Laboratories, Hsinchu 300, Taiwan, ROC |
| Abstract: | We investigated the nanotribological properties of Zn1−xMnxO epilayers (0 ≤ x ≤ 0.16) grown by molecular beam epitaxy (MBE) on sapphire substrates. The surface roughness and friction coefficient (μ) were analyzed by means of atomic force microscopy (AFM) and hysitron triboscope nanoindenter techniques.The nanoscratch system gave the μ value of the films ranging from 0.17 to 0.07 and the penetration depth value ranging 294-200 nm when the Mn content was increased from x = 0 to 0.16. The results strongly indicate that the scratch wear depth under constant load shows that higher Mn content leads to Zn1−xMnxO epilayers with higher shear resistance, which enhances the Mn-O bond. These findings reveal that the role of Mn content on the growth of Zn1−xMnxO epilayers can be identified by their nanotribological behavior. |
| Keywords: | Molecular beam epitaxy Scanning electron microscopy Transmission electron microscopy |
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