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Effects of assisting and sputtering ion current on ion beam assisted deposition textured yttria stabilized zirconia buffer layers of coated conductors |
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| Authors: | Z Wang F Feng BJ Yan YL Li ZT Jiang H Chen Z Han |
| Institution: | a Department of Physics, School of Science, Beijing Institute of Technology, Beijing 100081, People's Republic of China b Key Laboratory of Cluster Science of Ministry of Education, Beijing Institute of Technology, Beijing 100081, People's Republic of China c Applied Superconductivity Research Center, Department of Physics, Tsinghua University, Beijing 100084, People's Republic of China |
| Abstract: | Biaxially textured yttria stabilized zirconia (0 0 1) thin films were fabricated on untextured hastelloy substrates by ion beam assisted deposition method. The effects of assisting beam current density Ja and sputtering beam current density Js on the textures of the films were studied. The results indicate that as Ja or Js increase, both the out-of-plane and the in-plane textures are improved initially, and then degrade. The results can be attributed to anisotropic damage and selective sputtering effect of assisting ions. At the same ion-to-atom arrival ratio r, which is reflected with Ja/Js value, lower deposition rate can enhance the biaxial texture. |
| Keywords: | 74 76 &minus w 81 10 Bk 81 15 Ji |
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