Effect of citric acid on photoelectrochemical properties of tungsten trioxide films prepared by the polymeric precursor method |
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| Authors: | Wenzhang Li Jie Li Xuan Wang Jun Ma Qiyuan Chen |
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| Institution: | a College of Chemistry and Chemical Engineering, Central South University, Changsha, 410083, PR China
b Key Laboratory of Resources Chemistry of Nonferrous Metals, Ministry of Education, Changsha, 410083, PR China |
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| Abstract: | Effect of citric acid (CA) on microstructure and photoelectrochemical properties of WO3 films prepared by the polymeric precursor method was investigated. The obtained materials were characterized by means of X-ray diffraction (XRD), field-emission scanning electron microscopy (FESEM), and high-resolution transmission electron microscopy (HRTEM). The results showed that samples prepared with adding different amounts of citric acid had a pure phase of cubic. The addition of citric acid could significantly increase the particle size and change the surface of WO3 films. The photoelectrochemical measurements were performed using a standard three-electrode system cell. The films prepared from mass ratios of CA/PEG (R = 0, 0.2, 0.4, 0.6 and 1) showed 1.0, 1.4, 1.7, 2.1 and 0.9 mA cm−2 at 1.2 V under illumination with a 500 W xenon lamp (I0 = 100 mW/cm2), respectively. |
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| Keywords: | Citric acid WO3 thin films Polymeric precursor method Photoelectrochemistry |
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