On the temperature dependence of Na migration in thin SiO2 films during ToF-SIMS O2 depth profiling

The detection of Na in insulating samples by means of time of flight-secondary ion mass spectrometry (ToF-SIMS) depth profiling has always been a challenge. In particular the use of O₂⁺ as sputter species causes a severe artifact in the Na depth distribution due to Na migration under the influence of an internal electrical filed. In this paper we address the influence of the sample temperature on this artifact. It is shown that the transport of Na is a dynamic process in concordance with the proceeding sputter front. Low temperatures mitigated the migration process by reducing the Na mobility in the target. In the course of this work two sample types have been investigated: (i) A Na doped PMMA layer, deposited on a thin SiO₂ film. Here, the incorporation behavior of Na into SiO₂ during depth profiling is demonstrated. (ii) Na implanted into a thin SiO₂ film. By this sample type the migration behavior could be examined when defects, originating from the implantation process, are present in the SiO₂ target. In addition, we propose an approach for the evaluation of an implanted Na profile, which is unaffected by the migration process.