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Growth and characteristics of ZnO nano-aggregates electrodeposited onto p-Si(1 1 1) |
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| Authors: | Z. Messaï ,Z. Ouennoughi,T. Mouet,V. Harel,N. Bouguechal |
| Affiliation: | a Institut PRISME, Université d’Orléans, 21 rue Loigny la Bataille, 28000 Chartres, France b Laboratoire optoélectronique et composants, UFAS 19000, Algeria c Centre Universitaire de Bordj Bou-Arreridj, Département d’Electronique, 34000 Bordj Bou-Arreridj, Algeria d Institute for Superconducting and Electronic Materials, Engineering Faculty, University of Wollongong, 2522 Wollongong, Australia e Laboratoire d’Electronique Avancée (LEA), Département d’Electronique, Université de Batna, Batna, Algeria |
| Abstract: | In this paper we study nanocrystalline zinc oxide thin films produced by oxidation of electrodeposited zinc nanolayers on a monocrystalline p-Si(1 1 1) substrate.The electrolyte used is ZnCl2, an aqueous solution of 4 × 10−2 mol/l concentration. Several deposits were made for various current densities, ranging from 13 mA/cm2 to 44 mA/cm2, flowing through the solution at room temperature. A parametric study enabled us to assess the effect of the current density on nucleation potential and time as well as zinc films structure. The grazing incidence X-ray diffraction (GIXD) revealed that both Zn and ZnO films are polycrystalline and nanometric. After 1-h oxidation of zinc films at 450 °C in the open air, the structural analyses showed that the obtained ZnO films remained polycrystalline with an average crystal size of about 47 nm and with (1 0 0), (0 0 2) and (1 0 1) as preferential crystallographic orientations. |
| Keywords: | ZnO Electrodeposition p-Si(1 1 1) Nanolayer Nano-aggregates |
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