|
|||||
|
|
Passivation of aluminum with alkyl phosphonic acids for biochip applications |
|
| Authors: | Sachin Attavar Matthew R Linford Steve Blair |
| Institution: | a Department of Electrical Engineering, University of Utah, 50 South Central Campus Drive, Salt Lake City, UT 84112, United States b Department of Chemistry and Biochemistry, Brigham Young University, Provo, UT 84602, United States c MOXTEK Inc, 452 West 1260 North, Orem, UT 84057, United States |
| Abstract: | Self-assembly of decylphosphonic acid (DPA) and octadecylphosphonic acid (ODPA) was studied on aluminum films using XPS, ToF-SIMS and surface wettability. Modified aluminum films were tested for passivation against silanization and subsequent oligonucleotide attachment. Passivation ratios of at least 450:1 compared to unprotected aluminum were obtained, as quantified by attachment of radio-labeled oligos. |
| Keywords: | Biosenor DNA metallic microarray Phosphonic acid self-assembled monolayer |
| 本文献已被 ScienceDirect 等数据库收录！ | |