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Analysis of the electric field behavior in the vicinity of a triple junction,using finite elements method computational simulations
Institution:1. Plasma Laboratory, Department of Semiconductors, Instrumentation and Photonics, School of Electric and Computer Engineering, University of Campinas – UNICAMP, Cidade Universitária Zeferino Vaz, P.O. Box 6101, Barão Geraldo, Campinas, 13083-970 São Paulo, Brazil;2. ESSS – ANSYS, 423 Rocio St., ITC – International Trade Center, 10° Floor, Room: 1001/1002, Vila Olímpia, 04552-000 São Paulo, SP, Brazil;1. Solid State Electronics Laboratory, Solid State Physics Department, Physics Division, National Research Center, Dokki, Cairo 12311, Egypt;2. Basic Science Department, High Institute of Engineering and Technology, El-Arish, North Sinai, Egypt;3. Department of Chemistry, Faculty of Education, Al Jabal Al Gharbi University, Libya;1. Institute of Physics and Applied Physics, Yonsei University, Seoul 120-749, Republic of Korea;2. Department of Electric & Robotics Engineering, Soonchunhyang University, Asan, Chungnam 336-745, Republic of Korea;3. Department of Display and Electronic Information Engineering, Soonchunhyang University, Asan, Chungnam 336-745, Republic of Korea;1. University of Campinas (UNICAMP), School of Electrical and Computer Engineering (FEEC), Department of Systems and Energy (DSE), Av. Albert Einstein, 400, 13083-852 Campinas, SP, Brazil;2. Univ Estadual Paulista (UNESP), Campus of Sorocaba, Group of Automation and Integrated Systems (GASI), Av. Três de Março, 511, 18087-180 Sorocaba, SP, Brazil;1. Faculty of Science –University Chouaib Doukkali, Chemistry Departement, Laboratory Physico – Chemistry of Materials, El Jadida, Morocco;2. Faculty of Science –University Chouaib Doukkali, Chemistry Departement, Team of Thermodynamics, Catalysis and Surface Reactivity, El Jadida, Morocco
Abstract:The authors studied the electric field behavior in the vicinity of a triple junction, composed by metal, vacuum and dielectric parts, using computational simulations. A bi-dimensional model was constructed using ANSYS MAXWELL to analyze the magnitude of the electric field as a function of the contact angles of the materials. The results showed that a field enhancement or reduction could occur in vacuum for certain contact angles. The influence of the dielectric permittivity was also investigated, and the conclusions showed that the maximum electric field enhancement is proportional to the dielectric permittivity.
Keywords:Triple junction  Field enhancement  Finite element analysis
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