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Ion implanted species dependence in silicon oxidation
Authors:R A Collins  Mina Sanamrad  G Dearnaley
Institution:1. Department of Physics , University of Lancaster , Lancaster, LA1 4YB, England;2. AERE, Harwell, Didcot , Oxon, 0X11 ORA, England
Abstract:The effect on thermal oxidation of implantation of the alkali species Li, Na, K, Rb and Cs has been studied. A correlation is found with the atomic and ionic radii and atomic masses of the implanted species, the larger ions leading to greater oxidation. We propose that the implanted species may affect the oxide plasticity and that this may be the controlling factor which determines the degree of oxidation.
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