Chemical etching op fission tracks in ethylene-tetrafluoroethylene copolymer |
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| Authors: | Yoshihide Komaki Tadao Seguchi Shigeo Tsujimura |
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| Institution: | 1. Division of Chemistry, Tokai Research Establishment , Japan Atomic Energy Research Institute , Tokai-mura, Naka-gun, Ibaraki-ken, Japan;2. Takasaki Radiation Chemistry Research Establishment, Japan Atomic Energy Research Institute , Watanuki-cho, Takasaki-si, Gunma-Ken, Japan |
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| Abstract: | The chemical etching of fission tracks in ethylene-tetrafluoro-ethylene copolymer was studied. Etched holes 3000–4000 Å in diameter was recognized by electron microscopy for a film bombarded by fission fragments in oxygen and etched in a 12N sodium hydroxide solution at 125°C. The radial etching rate at 125°C was 6–8 Å/hr, which is less than 17 Å/hr for polyvinylidene fluoride in the same sodium hydroxide concentration at 85°C. The smaller rate is a reflection of the larger chemical resistivity of ethylene-tetrafluoro-ethylene copolymer than polyvinylidene fluoride. |
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