Role of the precursor state in the rate of hydrogen adsorption on thin iron films |
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| Authors: | P. Nowacki W. Lisowski R. Dus |
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| Affiliation: | (1) Institute of Physical Chemistry, Poish Academy of Sciences, ul. Kasprzaka 44/52, 01-224 Warszawa, Poland |
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| Abstract: | Sticking probability for hydrogen adsorption on thin iron films deposited under ultra-high vacuum condtions was studied in dependence on the method of film preparation and the temperature of adsorption. It was observed that Kisliuk's model for a dissociative adsorption fits well the experimental data at low temperature. At high temperature Kisliuk's relation describes the adsorption as well as the Langmuir equation.
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