The protection effect of β-CD on DNA damage induced by ultrafine TiO2 |
| |
作者单位: | ZHU RongRong(School of Life Science and Technology, Tongji University, Shanghai 200092, China) ;
WANG ShiLong(School of Life Science and Technology, Tongji University, Shanghai 200092, China) ;
SUN XiaoYu(School of Life Science and Technology, Tongji University, Shanghai 200092, China) ;
ZHANG Rui(School of Life Science and Technology, Tongji University, Shanghai 200092, China) ;
YAO SiDe(School of Life Science and Technology, Tongji University, Shanghai 200092, China) ; |
| |
基金项目: | Supported by the National Natural Science Foundation of China (Grant No. 50572074) and Shanghai Special Fund for Nano Materials (05nm05028). |
| |
摘 要: | Under the photocatalysis of 365 nm ultraviolet radiation, ultrafine TiO2 caused the oxidative damage of Teasy plasmid DNA. The damage was determined by gel-electrophoresis. Then, a different dose of β-CD was added to the reaction, and the damage was restrained. The rate of damage restraining reached 97% when the mass of β-CD was 4 times as that of TiO2. Through UV scan and IR spectroscopy, it was found that the Ti-O of ultrafine TiO2 was bound with -OH of β-CD cavum and the -OH on the surface of ultrafine TiO2 disappeared, so the formation of · OH was controlled. The ultrafine TiO2 has been widely used, but it was determined to be carcinogenic by some research. The protection effect of β-CD to DNA in the molecular level takes a new look on the surface modification of nano particles to decrease the toxic effect.
|
关 键 词: | β-CD ultrafine TiO2 plasmid DNA oxide damage bond reaction damage restrain |
收稿时间: | 10 January 2006 |
修稿时间: | 23 June 2006 |
本文献已被 SpringerLink 等数据库收录! |
|