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引用本文:庄娟,王德真,高欣欣,王艳辉.???????????????象?????????????о?[J].核聚变与等离子体物理,2009,29(1):87-91.
作者姓名:庄娟  王德真  高欣欣  王艳辉
作者单位:(?????????????????繤????????????????????????????????? 116024)
摘    要:建立一维自洽流体模型,对低压甚高频等离子体放电中产生的主要粒子建立连续性方程、动量方程和电流平衡方程。分析了甚高频对纳米粒子的种子离子SiH3-及电子和正离子SiH3+的影响,给出了种子离子、电子以及正离子密度随频率变化的时空演化过程。结果表明改变频率可以改变SiH3-的密度,从而控制粒子的成核及生长。同时甚高频放电也改变了等离子体中电子和正离子密度以及电场的强度,从而加快等离子体中的化学反应速度和纳米粒子的沉积速度。  

关 键 词:低气压放电  硅烷  尘埃  纳米硅
收稿时间:2008-04-06
修稿时间:2008-09-10

Study on high growth-rate deposition of nanocrystalline silicon thin film with VHF-PECVD
ZHUANG Juan,WANG De-zhen,GAO Xin-xin,WANG Yan-hui.Study on high growth-rate deposition of nanocrystalline silicon thin film with VHF-PECVD[J].Nuclear Fusion and Plasma Physics,2009,29(1):87-91.
Authors:ZHUANG Juan  WANG De-zhen  GAO Xin-xin  WANG Yan-hui
Institution:(State Key Laboratory for Materials Modification by Laser, Ion and Electron Beams, School of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian 116024)
Abstract:Using the self-consistent one dimensional fluid model,equations of particle-balance,momentum,charged particle flux and current continuum have been established to study the behavior of chief particles in low-pressure very high frequency plasma enhanced chemical vapor deposition(VHF-PECVD).The influence of VHF(very high frequency) has been analyzed and the profiles of SiH3- negative,electrons,SiH3+ positive density have been obtained.The simulation results show that the density of SiH3- negative changes with ...
Keywords:Low atmospheric-pressure discharge  Silane  Dust  Nanocrystalline silicon  
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