Degradation of carboxylic acids on Y2O3 surface under UV light. Synergism by semiconductors |
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| Institution: | 1. Beijing Key Laboratory of Materials Utilization of Nonmetallic Minerals and Solid Wastes, National Laboratory of Mineral Materials, School of Materials Science and Technology, China University of Geosciences Beijing, Beijing 100083, PR China;2. College of Science, Chongqing University of Posts and Telecommunications, Chongqing 400065, PR China;1. Departamento de Física Aplicada-ICMUV, MALTA Consolider Team, Universitat de Valencia, Edificio de Investigación, c/ Dr. Moliner 50, 46100 Burjassot, Spain;2. Chemistry Division, Bhabha Atomic Research Centre, Trombay, Mumbai 400085, India;1. University of Ferrara, Department of Physics and Earth Sciences, via Saragat 1, Ferrara, Italy;2. University of Florence, Department of Earth Sciences, via La Pira 4, Florence, Italy;3. University of Florence, Department of Chemistry ‘Ugo Schiff and INSTM RU’, via della Lastruccia 3-13, Sesto Fiorentino, Italy;4. CNR-ISTEC, Institute of Science and Technology for Ceramics, via Granarolo 64, Faenza, Italy;1. School of Engineering, Newcastle University, Newcastle NE1 7RU, United Kingdom;2. Chemical Process and Energy Resources Institute, Centre for Research and Technology Hellas, 57001, Thessaloniki, Greece;3. Department of Automation Engineering ATEI, Thessaloniki, Greece;4. Department of Mechanical Engineering, Aristotle University of Thessaloniki, 54124, Thessaloniki, Greece;5. Aston University, School of Engineering and Applied Science, Birmingham, United Kingdom |
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| Abstract: | Under UV light formic, oxalic, acetic and citric acids undergo degradation on the surface of Y2O3, an insulator. The oxidation of oxalic acid displays first-order kinetics with a linear dependence on light intensity. The photonic efficiency is lower with UV-A light than with UV-C light. While particulate TiO2, ZnO, CuO, Bi2O3 and Nb2O5 individually photocatalyze the oxidation, each semiconductor when present along with Y2O3 shows synergism, indicating interparticle electron-jump from oxalic acid-adsorbed Y2O3 to the band gap-excited semiconductor on collision. The ease of photodegradation of the acids on Y2O3 is as follows: formic>oxalic>acetic>citric. |
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