Comparison of the cold vapor generation using NaBH4 and SnCl2 as reducing agents and atomic emission spectrometry for the determination of Hg with a microstrip microwave induced argon plasma exiting from the wafer期刊界 All Journals 搜尽天下杂志传播学术成果专业期刊搜索期刊信息化学术搜索

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Comparison of the cold vapor generation using NaBH4 and SnCl2 as reducing agents and atomic emission spectrometry for the determination of Hg with a microstrip microwave induced argon plasma exiting from the wafer

Authors:	Pawel Pohl Israel Jimenéz Zapata Edgar Voges Nicolas H Bings José A C Broekaert

Institution:	Institut für Anorganische und Angewandte Chemie, Universit?t Hamburg, Hamburg, Germany Fakult?t für Elektrotechnik und Informationstechnik, Universit?t Dortmund, Dortmund, Germany

Abstract:

Keywords:	: Microstrip microwave induced plasma cold vapor generation SnCl₂ NaBH₄ mercury optical emission spectrometry
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