Investigations for the improvement of the radial doping homogeneity of dislocation-free floating zone silicon crystals

In order to improve the doping inhomogeneities of dislocation free FZ Silicon crystals with diameters ≧ 75 mm investigations were carried out to influence the shape and curvature of the crystallization interface during the crucible-free floating zone crystal growth process. In this works shapes and geometries of the applied melting inductors and the relative positions of these inductors to the seed axis were examined concerning the values of radial macroscopic and microscopic doping inhomogeneities in dependence on other growth parameters, for instance crystal rotation rate. The application of eccentric inductor-seed positions effects a decreasing “bending value” of the crystallization interface, that means an improvement of the macroscopic radial doping inhomogeneity with crystal rotation rate in the range between 4 and 8 min⁻¹.