Temperature Distributions Across the Plasma Layer of Planar Low Pressure Microwave Plasmas — A Comparative Investigation by Optical Emission Spectroscopy

Nowadays low temperature non-equilibrium plasmas received considerable attention in very different fields of plasma processing. The subject of the present paper is the comparative measurement of neutral gas temperature and optical excitation temperature to analyze the temperature distributions across the plasma layer of H₂ non-equilibrium plasmas (p = 0.2 – 1.5 kPa) with small admixtures of hydrocarbons in a novel planar microwave plasma source (2.45 GHz) used for plasmachemical deposition purposes by means of optical emission spectroscopy. Typical microwave power flux densities into the plasma lie within a range of 2 W cm^?2 to 20 W cm^?2. Results of neutral gas temperature measurements derived from H_α line Doppler profiles are compared with rotational temperatures of H₂ and N₂ molecules. The neutral gas temperature (800–1700 K) corresponds to the rotational temperature of the H₂ molecules (Fulcher band, R 0–0 branch) but shows a more distinct spatial gradient. The rotational temperature of admixtured N₂ molecules (2000–3000 K) is much more higher although Boltzmann distribution was ensured. The spatially resolved measured excitation temperature (1–3 eV) determined with the help of line intensity ratios of admixtured Ar well agrees with Langmuir probe measurements. The reported measurements as a whole demonstrate the feasibility of comparative investigations of different optically determined temperatures for expressive characterization of low pressure microwave plasmas.