| Abstract: | The method of plasma (ionic) etching provides information on both the degree of damage and the real structure of a treated surface of a cleavage crystallographic plane (110). The altered surface structure of this plane, which is due to cutting, grinding and polishing, is a cause of a rapid loss of calomel at the beginning of the etching process. The minimum loss rate is directly proportional to the thickness of the damaged surface. The ensuring rapid loss of calomel is due to an increased ruggedness of the surface. The ionic etching of calomel on the crystallographic plane (110) proceeds in six phases which are documented in photographs. The method of ionic etching is promissing for a high-quality treatment of surfaces of calomel acousto-optical functional elements designed for connections with ultrasound transducers. |
