Photo-oxidation of elastomers. A fundamental approach based on the study of a series of photo-sensitive elastomeric systems: A review |
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| Institution: | 1. Department S.B.A.I., Sapienza University of Rome, Via del Castro Laurenziano 7, I-00161 Roma, Italy;2. TyrekSrl, Via Isonzo 34/36, 36060 Fellette di Romano d''Ezzelino (VI), Italy;3. ENEA, Italian National Agency for New Technologies, Energy and Sustainable Economic Development, Casaccia Research, Centre, Via Anguillarese 301, 00123 Santa Maria di Galeria, Rome, Italy;4. Nano-structured Materials Institute, ISMN - CNR, I-00015 MonterotondoStaz, Rome, Italy;1. School of Electronic Engineering, Jilin University, Changchun, Jilin, China;2. Department of Radiology, Fujian Provincial Hospital, Fuzhou, Fujian, China;3. School of Electronic Engineering, University of Electronic Science and Technology of China, Chengdu, Sichuan, China;4. Department of Radiology, University of Pennsylvania, Philadelphia, PA 19104, USA;5. Institute of Digital Medicine, Third Military Medical University (TMMU), Chongqing, China |
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| Abstract: | The photo-oxidation and crosslinking of increasingly complex photo-sensitized elastomers were quantitatively investigated. An ethylene-propenebutadiene terpolymer (EPDM), selected as an elastomeric medium exhibiting reactive unsaturated side chains, was photo-sensitized with various chromophoric groups: grafted phenyl groups (systems I and II), different carbonyl functions (systems III and IV), blended photo-initiators dimethoxyphenylacetophenone (DMPA) (system V) and benzophenone (BP) (system VI). Knowledge of the behaviour of these model systems proves necessary to the understanding of the predominant processes involved in the photo-oxidation of ethylene-propene rubber (EPR or EPM) blended with DMPA (system VII) or BP (system VIII) and of a random styrene-butadiene (SBR) copolymer (system IX). |
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