Total pressure dependence of doping element incorporation during the chemical vapour deposition of epitaxial silicon

Starting from the literature on doping element incorporation at atmospheric and lower pressures the partial pressure of the dopants available within the deposition system is selected as a uniform basis of reference for the total pressure dependence of the doping element incorporation. It is shown that also at reduced pressures the incorporation equilibria of phosphor and arsenic, the author previously derived from the temperature dependence of the doping element incorporation may be used.