Contact angle hysteresis at the nanometer scale |
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Authors: | Delmas Mathieu Monthioux Marc Ondarçuhu Thierry |
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Institution: | CEMES-CNRS, 29 rue Jeanne Marvig, 31055 Toulouse cedex 4, France. |
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Abstract: | Using atomic force microscopy with nonconventional carbon tips, the pinning of a liquid contact line on individual nanometric defects was studied. This mechanism is responsible for the occurrence of the contact angle hysteresis. The presence of weak defects which do not contribute to the hysteresis is evidenced for the first time. The dissipated energy associated with strong defects is also measured down to values in the range of kT, which correspond to defect sizes in the order of 1 nm. |
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