Properties of Indium-Doped ZnO Films Prepared in an Oxygen-Rich Plasma |
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Authors: | Hui Li Erqing Xie Min Qiao Xiaojun Pan Yongzhe Zhang |
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Institution: | (1) School of Physics and Technology, Lanzhou University, Lanzhou, 730000, Gansu, People’s Republic of China |
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Abstract: | Indium-doped zinc oxide (ZnO:In) films were prepared in an Ar:O2 plasma by reactive magnetron sputtering. The x-ray diffraction (XRD) patterns presented the crystal structures of ZnO:In
films, while transmission spectra and photoluminescence (PL) spectra showed the changed band gap and the visible emission
from defects, as compared to the PL spectra of undoped ZnO films. It was concluded that the increase of substrate temperature
enhanced the crystal quality of ZnO:In films; the incorporation of In made the c-axis constant of the samples larger than that of undoped ZnO films; the blue emission was due to the transition from an unknown
donor level by indium doping to the valance band; and the orange-green emission originated from acceptor defects (OZn) formed in the O-rich plasma. Meanwhile, the current- voltage characteristics and persistent photoconductivity phenomenon
also could be explained by the increased acceptor defects (OZn) that formed when the substrate temperature was increased. |
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Keywords: | ZnO indium optical properties |
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