| 透射式GaAs光电阴极AlGaAs/GaAs外延层内应力的种类及其表征与测量 |
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| 引用本文： | 李晓峰,张景文,高鸿楷,侯洵.透射式GaAs光电阴极AlGaAs/GaAs外延层内应力的种类及其表征与测量[J].光子学报,2002,31(1):88-92. |
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| 作者姓名： | 李晓峰 张景文 高鸿楷 侯洵 |
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| 作者单位： | 中国科学院西安光学精密机械研究所光电子学研究室,西安,710068 |
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| 摘 要： | 本文介绍了透射式GaAs光电阴极AlGaAs窗层和GaAs光电发射外延层内应力的种类及其表征方法和测量方法,另外还给出了相应的实例.
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| 关 键 词： | GaAs/AlGaAs 光电阴极 X射线衍射 应力 外延 |
| 收稿时间： | 2001/7/5 |
| 修稿时间： | 2001年7月5日 |
THE VARIETIES,REPRESENTATION AND MEASURING ON THE STRESSES OF AlGaAs/GaAs EPITAXIAL LAYER IN THE TRANSPARENT GaAs PHOTOCATHODE |
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| Li Xiaofeng,Zhang Jingwen,Gao Hongkai,Hou Xun.THE VARIETIES,REPRESENTATION AND MEASURING ON THE STRESSES OF AlGaAs/GaAs EPITAXIAL LAYER IN THE TRANSPARENT GaAs PHOTOCATHODE[J].Acta Photonica Sinica,2002,31(1):88-92. |
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| Authors: | Li Xiaofeng Zhang Jingwen Gao Hongkai Hou Xun |
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| Institution: | Xi’an Institute of Optics and Precision Mechanics, Chinese Academy of Sciences, Xi’an 710068 |
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| Abstract: | The stresses overall epitaxial wafer can be represented by the curvature radius of the wafer,furthermore the curvature radius of curved wafer can be measured by X-ray diffraction.This paper described the varieties,the presetation and measuring method of stresses on AlGaAs/GaAs epitaxial layer.Besides experimental data and analysing results were given in this paper . |
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| Keywords: | GaAs/AlGaAs Photocathode X-ray diffraction Stress Epitaxy |
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